000K  utf8
1100  $c2001
1500  eng
2050  urn:nbn:de:gbv:8-diss-4457
3000  Sprung, Michael
4000  Adsorbed films of methyl halides on magnesium oxide and boron nitride$hChristian-Albrechts-Universität zu Kiel  [Sprung, Michael]
4030  Kiel$nChristian-Albrechts-Universität zu Kiel
4209  Adsorption isotherm techniques and x-ray powder diffraction were used to study adsorbed films of three methyl halides (CH3R, R=Cl, Br, I) on magnesium oxide (MgO) and boron nitride (BN). The aim of these studies was to gain a better understanding of the behavior of polar molecules under the influence of substrates with different surface geometry. Volumetric adsorption isotherms were used to determine the adsorption areas of the substrate, the molecular areas of the adsorbate and some thermodynamic quantities of the adsorbed system such as the isosteric heat of adsorption and the 2D compressibility. In addition, layering transitions and the wetting behavior near the triple point were investigated for CH3Cl on MgO and BN and for CH3Br and CH3I on MgO. X-ray powder diffraction was used to determine the structural properties of monolayers of methyl halides adsorbed on both substrates. The use of an image plate detector system was employed for the first time in studies of adsorbed films. Temperature and coverage dependent measurements were undertaken to investigate the monolayer structures of CH3Cl, CH3Br and CH3I on MgO and BN.
4950  https://nbn-resolving.org/urn:nbn:de:gbv:8-diss-4457$xR$3Volltext$534
4961  https://macau.uni-kiel.de/receive/diss_mods_00000445
5051  540
5550  adsorption
5550  Adsorptionsisotherme
5550  BN
5550  Bornitrid
5550  boron nitride
5550  Halogenmethane
5550  image plate
5550  isotherm
5550  Magnesiumoxid
5550  magnesium oxide
5550  methyl halide
5550  MgO
5550  monolayer
5550  Oberfläche
5550  wetting