000K utf8 1100 $c2001 1500 eng 2050 urn:nbn:de:gbv:8-diss-4457 3000 Sprung, Michael 4000 Adsorbed films of methyl halides on magnesium oxide and boron nitride$hChristian-Albrechts-Universität zu Kiel [Sprung, Michael] 4030 Kiel$nChristian-Albrechts-Universität zu Kiel 4209 Adsorption isotherm techniques and x-ray powder diffraction were used to study adsorbed films of three methyl halides (CH3R, R=Cl, Br, I) on magnesium oxide (MgO) and boron nitride (BN). The aim of these studies was to gain a better understanding of the behavior of polar molecules under the influence of substrates with different surface geometry. Volumetric adsorption isotherms were used to determine the adsorption areas of the substrate, the molecular areas of the adsorbate and some thermodynamic quantities of the adsorbed system such as the isosteric heat of adsorption and the 2D compressibility. In addition, layering transitions and the wetting behavior near the triple point were investigated for CH3Cl on MgO and BN and for CH3Br and CH3I on MgO. X-ray powder diffraction was used to determine the structural properties of monolayers of methyl halides adsorbed on both substrates. The use of an image plate detector system was employed for the first time in studies of adsorbed films. Temperature and coverage dependent measurements were undertaken to investigate the monolayer structures of CH3Cl, CH3Br and CH3I on MgO and BN. 4950 https://nbn-resolving.org/urn:nbn:de:gbv:8-diss-4457$xR$3Volltext$534 4961 https://macau.uni-kiel.de/receive/diss_mods_00000445 5051 540 5550 adsorption 5550 Adsorptionsisotherme 5550 BN 5550 Bornitrid 5550 boron nitride 5550 Halogenmethane 5550 image plate 5550 isotherm 5550 Magnesiumoxid 5550 magnesium oxide 5550 methyl halide 5550 MgO 5550 monolayer 5550 Oberfläche 5550 wetting