Deposition of Zn-containing films using atmospheric pressure plasma jet

The  purpose  of  this  work  was  to  deposit  Zn-containing films on Si substrates using the commercial atmospheric  pressure  plasma  jet  “kINPen’09.”  In preliminary  experiments  Zn-containing  films  were deposited  on  the  silicon  substrates  immersed  in water  solutions  of  Zn(NO 3 ) 2 •6H 2 O  salt.  The  surface composition  of  deposited  films  was  analyzed  by  the XPS (X-ray photoelectron spectroscopy) technique while the  bulk  composition  was  studied  by  means  of  XRD (X-ray  diffraction)  mesurements.  The  film  thickness  was measured  by  a  profilometer.  We  have  determined  that the  concentration  of  the  zinc  nitrate  solution  as  well as  changes  in  the  deposition  time  resulted  in  a  large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed.

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